When it comes to marking of solar cells made of mono- and polycrystalline silicon, demands for a coding system are high. The surfaces provide strongly varying contrast conditions and reflections. Conditions under which microglyph codes are reliably applied.
At the beginning of the process chain, microglyph codes are marked on the wafer surface by lasers processes, without impairing the electrical conductivity of the final solar cells.
The manufacturing process for the marked semiconductor components comprises numerous etching and polishing steps. At the end of the process chain, the robustness and high error tolerance of microglyph codes ensures traceability of the whole manufacturing process.